NESC Training

Please contact Kolin Brown, ksbrown@mail.wvu.edu, to sign up for a training session. Demonstrations to use the stylus profiler or critical CO2 dryer can be made by appointment. The Cleanroom Protocol training is a prerequisite for all other trainings.

Fall 2008 Cleanroom Training Scheduled

Training	Scheduled Week
Cleanroom Protocol (Required before any other training.)	Week of Sept. 1st and Sept. 29th
Cleanroom Chemicals	Week of Sept. 8th and Oct. 6th
Photolithography	Week of Sept. 15th and Oct. 13th
Sputtering	Week of Sept. 22nd and October 20th
RIE and PECVD	Week of Sept. 29th and October 27th

FOM Trainings in Room G3/5 Engineering Science Building
Friday, August 29th , 9:30-10:00
Tuesday, September 2nd, 12:30-1:00
Wednesday, September 3rd, 10:30-11:00
Friday, September 5h, 1:30-2:00
fom.wvu.edu

If you would like to register for training please contact Kolin Brown at ksbrown@mail.wvu.edu. You should include your schedule in the email so that Dr. Brown can select a day and time convenient for everyone.

Cleanroom Protocol Training (~1 hr)
Required for any person who wishes to work inside the Nanosystems Engineering Shared Cleanroom Facility
The cleanroom protocol training provides an orientation to cleanrooms and contamination control. Laboratory rules of conduct and dress code will be explained, and the laboratory services and consumables which are provided will be listed.

Chemical Handling Training (~1 ½ hr)
Required for any lab user who wants to work with chemicals or perform photolithography
This training introduces the types of specialized chemicals used in the cleanroom and their associated safety hazard. Proper use and disposal techniques to avoid contamination are discussed, as well as the material path in and out of the cleanroom.

Photolithography Training (~2 hrs)
Required before using the spinner, photomask aligner or flood exposure source
This training presents an overview the chemical reaction that occurs in photoresist, as well as discussing the hazards of UV light and photoresist handling. Users are then presented with a typical positive resist process flow. Instruction on proper use of the photoresist spinner and MA6 Aligner is given through demonstration.

Sputter Training (~1hr)
Required before using the sputter station
Users are presented with a theoretical understanding of the sputter process and given a demonstration of operating the CVC sputtering station.

RIE/PECVD Training (~1 ½ hr)
Required before using the Reactive Ion Etcher or Plasma Enhanced Chemical Vapor Deposition Systems
An overview of basic plasma physics and its uses in reactive ion etching chemistry and plasma enhanced chemical vapor depositions is presented. Machine operation is demonstrated inside the cleanroom.

Wire Bonding Training (~?)
Required before using the gold wire bonder

This training presents the method of ball/wedge gold wire bonding, and utilizes hands on practice to demonstrate the basics difficulties incurred during ball/wedge bonding, which includes threading the bonder. (Wedge/wedge bonding training can be provided by request, but it is recommended that a user masters ball/wedge bonding before advancing to wedge/wedge bonding.)